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Volumn 200, Issue 7, 2005, Pages 2223-2227

Electrodeposition of Co-Mo-P barrier coatings for Cu/Au coated systems

Author keywords

Amorphous coating; Barrier coating; Electroplating; Interdiffusion coefficients; Nickel ion release

Indexed keywords

AMORPHOUS FILMS; COBALT ALLOYS; COMPOSITION EFFECTS; ELECTRODEPOSITION; ELECTROPLATING; INTERDIFFUSION (SOLIDS); NICKEL; SALTS;

EID: 29244475730     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.07.125     Document Type: Article
Times cited : (20)

References (7)
  • 2
    • 29244448571 scopus 로고    scopus 로고
    • The European Council Directive 94/27/EC (OJ No. L188 22/7/94)
    • The European Council Directive 94/27/EC (OJ No. L188 22/7/94), p. 1.
  • 5
    • 29244437734 scopus 로고    scopus 로고
    • MPhil thesis,The Hong Kong Polytechnic University, Hong Kong
    • K.M. Chow, MPhil thesis,The Hong Kong Polytechnic University, Hong Kong, 1997.
    • (1997)
    • Chow, K.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.