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Surface and Coatings Technology

Volumn 200, Issue 7, 2005, Pages 2165-2169

The influence of the ion current density on plasma nitriding process

(3) Ochoa, E A a Figueroa, C A a Alvarez, F a

a UNIVERSITY OF CAMPINAS (Brazil)

Author keywords

Hardness; Ionic implantation; Nitriding

Indexed keywords

COMPOSITION EFFECTS; CURRENT DENSITY; HARDNESS; ION BEAMS; ION IMPLANTATION; NITRIDING; PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY; STEEL; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ION CURRENT DENSITY; NITROGEN BULK PROFILE CONCENTRATION; PULSED PLASMA NITRIDING;

PROTECTIVE COATINGS;

COATING;

EID: 29244455271 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.09.004 Document Type: Article

Times cited : (44)

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