The electrochemical behaviour of the bright chromium deposits plated with direct- and pulse-current in 1 M H2SO4

Corrosion Science

Volumn 48, Issue 2, 2006, Pages 460-471

  Huang, C A ^a   Lin, W ^b   Liao, M J ^a  

^a CHANG GUNG UNIVERSITY   (Taiwan)

^b Fine Casting Works   (Taiwan)

Author keywords

Chromium deposit; Electrochemical behavior; Pulse current; Surface crack density

Indexed keywords

CHROMITE DEPOSITS; CRACK INITIATION; CURRENT DENSITY; ELECTRIC CURRENTS; ELECTRIC IMPEDANCE; POLARIZATION;

CHROMIUM DEPOSIT; ELECTROCHEMICAL BEHAVIOR; PULSE-CURRENT; SURFACE-CRACK DENSITY;

ELECTROCHEMISTRY;

ELECTROCHEMICAL ANALYSIS;

EID: 29244451850     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2004.12.002     Document Type: Article

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