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Volumn 5874, Issue , 2005, Pages 1-11

Optical design of the Terrestrial Planet Finder Coronagraph starlight suppression system

Author keywords

Coronagraph; Exoplanet detection; Optical Design

Indexed keywords

CORONOGRAPH; EXOPLANET DETECTION; OPTICAL PATHS; STARLIGHT SUPPRESSION SYSTEM (SSS);

EID: 29144439333     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.613794     Document Type: Conference Paper
Times cited : (6)

References (12)
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    • Ford, V.G.1
  • 3
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    • A coronagraph with a band-limited mask for finding terrestrial planets
    • M. J. Kuchner and W. A. Traub: "A coronagraph with a band-limited mask for finding terrestrial planets," ApJ 570, 2002
    • (2002) ApJ , vol.570
    • Kuchner, M.J.1    Traub, W.A.2
  • 4
    • 0037612126 scopus 로고    scopus 로고
    • Optimal shaped pupil coronagraphs for extrasolar planet finding
    • N. J. Kasdin, R. Vanderbei, D. Spergle, and M. Glittman, "Optimal shaped pupil coronagraphs for extrasolar planet finding," Proc. SPIE 4860, 240-250 (2002)
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    • Kasdin, N.J.1    Vanderbei, R.2    Spergle, D.3    Glittman, M.4
  • 6
    • 29144500091 scopus 로고    scopus 로고
    • The Terrestrial Planet Finder Coronagraph Error Budget
    • to appear
    • S. Shaklan et al, "The Terrestrial Planet Finder Coronagraph Error Budget," to appear in Proc. SPIE 5905 (2005)
    • (2005) Proc. SPIE , vol.5905
    • Shaklan, S.1
  • 8
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    • Polarization compensating protective coatings for TPF-Coronagraph optics to control contrast degrading cross polarization leakage
    • to appear in
    • K. Balasubramanian, D. Hoppe, P. Z. Mouroulis, L. Marchen, and S. Shaklan: "Polarization compensating protective coatings for TPF-Coronagraph optics to control contrast degrading cross polarization leakage", to appear in Proc. SPIE 5905 (2005)
    • (2005) Proc. SPIE , vol.5905
    • Balasubramanian, K.1    Hoppe, D.2    Mouroulis, P.Z.3    Marchen, L.4    Shaklan, S.5
  • 9
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    • Banning, M.1
  • 10
    • 0035759064 scopus 로고    scopus 로고
    • Achieving low wave front specifications for DUV lithography; impact of residual stress in HPFS® fused silica
    • J. L. Ladison et al. "Achieving low wave front specifications for DUV lithography; impact of residual stress in HPFS® fused silica", Proc. SPIE 4346, 1416-1423 (2001)
    • (2001) Proc. SPIE , vol.4346 , pp. 1416-1423
    • Ladison, J.L.1
  • 11
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    • Effect of residual stress in optical glass on the transmitted wave front
    • A. J. Marker, III, B. Wang, and R. Klimek: "Effect of residual stress in optical glass on the transmitted wave front", Proc. SPIE 4102, 211-218 (2000)
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    • 2 and fused silica for DUV applications
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.