A CMOS-integrated microinstrument for trace detection of heavy metals

IEEE Journal of Solid-State Circuits

Volumn 40, Issue 12, 2005, Pages 2777-2786

  Martin, Steven M ^a,b,c   Gebara, Fadi H ^b,d   Larivee, Brian J ^a,b,e   Brown, Richard B ^a,b,f,g,h,i  

^a IEEE   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

^c Sonetics Ultrasound   (United States)

^d IBM AUSTIN RESEARCH LABORATORY   (United States)

^e ANALOG DEVICES INC   (United States)

^f UNIVERSITY OF UTAH   (United States)

^g Department of Electrical and Computer Engineering   (United States)

^h ACM   (United States)

ⁱ MOSIS Advisory Council for Education   (United States)

Author keywords

Chemical transducers; Device fabrication; Noise; System analysis and design

Indexed keywords

CHEMICAL TRANSDUCERS; DEVICE FABRICATION; NOISE; SYSTEMS ANALYSIS AND DESIGN;

ANODES; GOLD; HEAVY METALS; MICROPROCESSOR CHIPS; SENSORS; SPURIOUS SIGNAL NOISE; SYSTEMS ANALYSIS; THIN FILMS; TRANSDUCERS;

CMOS INTEGRATED CIRCUITS;

EID: 29044444845     PISSN: 00189200     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSSC.2005.858478     Document Type: Conference Paper

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