Reduction of matrix effects in TOF-SIMS analysis by metal-assisted SIMS (MetA-SIMS)

Surface and Interface Analysis

Volumn 37, Issue 12, 2005, Pages 1111-1114

  Inoue, M ^a   Murase, A ^a  

^a Rd Management Section   (Japan)

Author keywords

Matrix effect; Metal assisted SIMS (MetA SIMS); Silver deposition; Time of flight secondary ion mass spectrometry (tof sims)

Indexed keywords

ELECTRIC CONDUCTIVITY; METAL ANALYSIS; SECONDARY ION MASS SPECTROMETRY; SILICON WAFERS; SURFACE STRUCTURE;

MATRIX EFFECTS; METAL-ASSISTED SIMS; SILVER DEPOSITION; TOF-SIMS;

REDUCTION;

EID: 29044443817     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.2121     Document Type: Article

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