Performance comparison of MIM capacitors and metal finger capacitors for analog and RF applications

2004 RF and Microwave Conference, RFM 2004 - Proceedings

Volumn , Issue , 2004, Pages 85-89

  Lim, Queennie S I ^a   Kordesch, Albert V ^b   Keating, Richard A ^b  

^a UNIVERSITI KEBANGSAAN MALAYSIA   (Malaysia)

^b SILTERRA MALAYSIA SDN BHD   (Malaysia)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; IMPEDANCE MATCHING (ELECTRIC); Q FACTOR MEASUREMENT; SILICON NITRIDE; TEMPERATURE;

METAL FINGER CAPACITORS; PROCESS TOLERANCE; TEMPERATURE COEFFICIENT;

MIM DEVICES;

EID: 29044434132     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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3. Samarati H., Hajimiri A. and Shahani A. R., "Fractal Capacitors", IEEE Journal of Solid-StateCircuit, vol. 33, pp. 2035-2041, December 1998.
4. Rajagopalan J. and Basil H., "Optimization of Metal-Metal Comb-Capacitors for RF Application", Publication in OEA International, Inc, 2003.
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6. Keating R. A., "Silterra CMOS18 Mixed-Signal and RF Device Characterization Report", Rev. 3.0, pp. 20-24, June 2003.
7. TestChip Technologies, Inc., "CMOS18 Analog Circuits", Rev. 1.0, August 2004.
8. Advanced RFIC (S) Pte. Ltd., "RF Device Characterization and Modeling of MIM Capacitors for Silterra Malaysia Sdn. Bhd. 0.18um Mixed-Signal RF CMOS Process", Rev. 0.0, January 2004.