Sputtered Fe1-x(N1-yCy)x films obtained in various (Ar-N2-CH4) reactive plasmas

Surface and Coatings Technology

Volumn 200, Issue 5-6, 2005, Pages 1690-1695

  Jouanny, Isabelle ^a   Billard, A ^a   Loi, Tran Huu ^a   Demange, V ^a   Bauer Grosse, E ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

B Transmission electron microscopy (TEM); B X ray diffraction; C Reactive Sputtering; D Carbides; D Nitrides; X Carbonitrides

Indexed keywords

CARBIDES; CARBON NITRIDE; IRON COMPOUNDS; MAGNETRON SPUTTERING; NITRIDES; PLASMAS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

REACTIVE PLASMAS; REACTIVE SPUTTERING;

PROTECTIVE COATINGS;

COATING;

EID: 28844501369     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.08.075     Document Type: Article

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