A novel method for in-line process monitoring by measuring the gray level values of SEM images

IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Volumn , Issue , 2005, Pages 143-146

  Jau, Jack ^a   Fang, Wei ^a   Xiao, Hong ^a  

^a Hermes Microvision Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE PROCESSING; PRODUCTION CONTROL; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

GRAY LEVEL VALUE (GLV); PROCESS SIGNATURE;

PROCESS CONTROL;

EID: 28744453455     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/issm.2005.1513319     Document Type: Conference Paper

References (3)

1. X. Liu, et al., J. Vac. Sci. Tech. B, 22, pp.3534-3538, 2004.
2. Lreimer, "Scanning Electron Microscopy, Physics of Image Formation and Microanalysis", Second Edition, Springer, New York, 1998.
3. Jack Jau, et al., Method and System for Monitoring IC Process, US patent pending, 2003.