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Volumn 96, Issue 11, 2005, Pages 1272-1277
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A usable concept for the indentation of thin porous films
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Author keywords
Indentation measurement; Mechanical properties; Porous low k materials; Von Mises stress; Xerogel
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Indexed keywords
DEFORMATION;
EXTRAPOLATION;
INDENTATION;
MECHANICAL PROPERTIES;
POROUS MATERIALS;
POROUS SILICON;
YIELD STRESS;
INDENTATION MEASUREMENTS;
VON MISES STRESS;
XEROGEL;
THIN FILMS;
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EID: 28644449145
PISSN: 00443093
EISSN: None
Source Type: Journal
DOI: 10.3139/146.101174 Document Type: Conference Paper |
Times cited : (3)
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References (17)
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