Proton beam lithography at the University of Surrey's Ion Beam Centre

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 242, Issue 1-2, 2006, Pages 387-389

  Mistry, P ^a   Gomez Morilla, I ^a   Grime, G W ^a   Webb, R ^a   Jeynes, C ^a   Gwilliam, R ^a   Cansell, A ^a   Merchant, M ^a   Kirkby, K J ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

GaAs; PMMA; Proton beam lithography

Indexed keywords

ION BEAMS; LITHOGRAPHY; MICROSTRUCTURE; PHOTOSENSITIVE GLASS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR MATERIALS;

BULK POLYMERS; GAAS; PMMA; PROTON BEAM LITHOGRAPHY;

PROTON BEAMS;

EID: 28544447939     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.08.128     Document Type: Conference Paper

References (5)

1. M.B.H. Breese, G.W. Grime, and F. Watt MeV ion beam lithography of PMMA Nucl. Instr. and Meth. B 77 1993 169
2. J.A. van Kan, J.L. Sanchez, B. Xu, T. Osipowicz, and F. Watt Micromachining using focused high energy ion beams: deep ion beam lithography Nucl. Instr. and Meth. B 148 1999 1085
3. M.H. Abraham, I. Gomez-Morilla, M. Marsh, G.W. Grime, Proton induced structuring of a photostructurable glass, in: Proceedings of MRS 2002 Fall Meeting, Symposium H: Three-Dimensional Nanoengineered Assemblies.
4. A. Bettiol, C.N.B. Udalagama, J.A. van Kan, F. Watt, Ionscan: Proton beam writing scan and control software, Centre for Ion Beam Applications, Department of Physics, National University of Singapore, 1st International Workshop on Proton Beam Writing, 18-22 July 2004, Singapore.
5. J.F. Ziegler, J.P. Biersack, SRIM 2003 (Stopping and Range of Ions in Matter). Available from: .