Method for measuring reticles with pellicles mounted

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5446, Issue PART 2, 2004, Pages 770-775

  Lee, Chris ^a   Kulawiec, Andrew ^a   Tronolone, Mark ^a   Nakamura, Yoshihiro ^b   Murakami, Takayuki ^b  

^a Corning Tropel ^*  (United States)

^b SOL Corp   (Japan)

Author keywords

Flatness; Pellicle; Photomask; Reticle; Thickness variation; Tropel; UltraFlat

Indexed keywords

DATA REDUCTION; IMAGE QUALITY; INFORMATION RETRIEVAL; INTERFEROMETERS; LITHOGRAPHY; PHOTORESISTS; SURFACE TREATMENT;

FLATNESS; PELLICLES; PHOTOMASKS; RETICLES; THICKNESS VARIATION; TROPEL; ULTRAFLAT;

MASKS;

EID: 11844255465     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557766     Document Type: Conference Paper

References (0)