On the evaluation of scaling of QCA devices in the presence of defects at manufacturing

IEEE Transactions on Nanotechnology

Volumn 4, Issue 6, 2005, Pages 740-742

  Momenzadeh, Mariam ^a,b   Huang, Jing ^a,b   Tahoori, Mehdi B ^a,b   Lombardi, Fabrizio ^a,b  

^a IEEE   (United States)

^b Northeastern University   (United States)

Author keywords

Defect tolerance; Quantum dot cellular automata (QCA); Scaling

Indexed keywords

DEFECT TOLERANCE; QUANTUM-DOT CELLULAR AUTOMATA (QCA); SCALING;

COMPUTER SIMULATION; CRYSTAL DEFECTS; NANOTECHNOLOGY;

SEMICONDUCTOR QUANTUM DOTS;

EID: 28444474882     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2005.858611     Document Type: Article

References (6)

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