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Volumn 5836, Issue , 2005, Pages 540-548

Micromachined IR-source with excellent blackbody like behaviour

Author keywords

Black body radiation; Ir emitter; Macro porous silicon; Planar thermal source; Thermal emitter

Indexed keywords

CRYSTAL STRUCTURE; PARTICULATE EMISSIONS; RADIATORS; SILICON;

EID: 28344442943     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.608712     Document Type: Conference Paper
Times cited : (53)

References (5)
  • 2
    • 0025386899 scopus 로고
    • Formation mechanism and properties of electrochemically etched trenches in n-type silicon
    • Lehmann, V., Föll, H., 1990, Formation mechanism and properties of electrochemically etched trenches in n-type silicon, J. Electrochem. Soc., Vol. 137, pp. 653-660
    • (1990) J. Electrochem. Soc. , vol.137 , pp. 653-660
    • Lehmann, V.1    Föll, H.2
  • 3
    • 0029732934 scopus 로고    scopus 로고
    • Processing of three-dimensional microstructures using macroporous n-type silicon
    • J.S. Ottow, V. Lehmann, H. Föll, Processing of three-dimensional microstructures using macroporous n-type silicon, J. Electrochem. Soc. 143 (1996) 385-390
    • (1996) J. Electrochem. Soc. , vol.143 , pp. 385-390
    • Ottow, J.S.1    Lehmann, V.2    Föll, H.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.