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Volumn 90, Issue 3, 2006, Pages 308-328

Optimization of an industrial DC magnetron sputtering process for graded composition solar thermal absorbing layer

Author keywords

Graded index coating; Solar thermal absorber; Sputtering

Indexed keywords

ARGON; COATINGS; ELECTRIC VARIABLES MEASUREMENT; OPTIMIZATION; OXYGEN; SOLAR ABSORBERS;

EID: 28244455266     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2005.03.018     Document Type: Article
Times cited : (20)

References (14)
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  • 2
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    • Borås
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    • (1994) SP Report , pp. 13
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  • 4
    • 0032141364 scopus 로고    scopus 로고
    • Industrially sputtered solar absorber surface
    • E. Wäckelgård, and G. Hultmark Industrially sputtered solar absorber surface Sol. Energy Mater. Sol. Cells 54 1998 165 170 and Patent by Sunstrip AB, Sputtering III 0948662
    • (1998) Sol. Energy Mater. Sol. Cells , vol.54 , pp. 165-170
    • Wäckelgård, E.1    Hultmark, G.2
  • 9
    • 36549098647 scopus 로고
    • Predicting thin-film stoichiometry in reactive sputtering
    • S. Berg, T. Larsson, C. Nender, and H.-O. Blom Predicting thin-film stoichiometry in reactive sputtering J. Appl. Phys. 63 1988 887 891
    • (1988) J. Appl. Phys. , vol.63 , pp. 887-891
    • Berg, S.1    Larsson, T.2    Nender, C.3    Blom, H.-O.4
  • 10
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    • Reactive sputtering
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    • W.D. Westwood Reactive sputtering M.H. Francombe J.L. Vossen Physics of Thin Films vol. 14 1989 Academic Press New York 3 6
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    • Westwood, W.D.1
  • 13
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    • Deposition and properties of nickel oxide films produced by DC reactive magnetron sputtering
    • I. Hotovy, J. Huran, J. Janik, and A.P. Kobzev Deposition and properties of nickel oxide films produced by DC reactive magnetron sputtering Vacuum 51 1998 157 160
    • (1998) Vacuum , vol.51 , pp. 157-160
    • Hotovy, I.1    Huran, J.2    Janik, J.3    Kobzev, A.P.4
  • 14
    • 1142289737 scopus 로고    scopus 로고
    • XPS depth profile analysis of non-stoichiometric NiO films
    • S. Oswald, and W. Bruckner XPS depth profile analysis of non-stoichiometric NiO films Surf. Interface Anal. 36 2004 17 22
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    • Oswald, S.1    Bruckner, W.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.