X-ray reflectivity study of acid-base post-synthesis treatments of mesoporous thin films templated by P123

Thin Solid Films

Volumn 495, Issue 1-2, 2006, Pages 191-196

  Bardeau, J F ^a   Gourbil, A ^a   Dutreilh Colas, M ^a   Dourdain, S ^a   Mehdi, A ^b   Gibaud, A ^a  

^a UNIVERSITÉ DU MAINE   (France)

^b UNIVERSITÉ DE MONTPELLIER   (France)

Author keywords

Mesoporous silica; SBA 15; X ray reflectivity

Indexed keywords

CARRIER CONCENTRATION; EVAPORATION; POLYETHYLENE OXIDES; POLYPHENYLENE OXIDES; SELF ASSEMBLY; SILICA; SURFACE ACTIVE AGENTS; SYNTHESIS (CHEMICAL);

MESOPOROUS SILICA; POST-SYNTHESIS TREATMENT; SBA-15; X-RAY REFLECTIVITY;

THIN FILMS;

EID: 28044436979     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.357     Document Type: Conference Paper

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