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Volumn 28, Issue 4, 2005, Pages 291-296

Duromer MID technology for system-in-package generation

Author keywords

Duromer molded interconnect device (MID); Encapsulation; Laser structuring; Metallization; Nano enhanced materials; System in package (SiP); Three dimensional (3 D) packaging; Wafer level packaging

Indexed keywords

COST EFFECTIVENESS; ENCAPSULATION; EPOXY RESINS; METALLIZING; MICROELECTROMECHANICAL DEVICES; MICROELECTRONICS; NANOSTRUCTURED MATERIALS; PLASTICS MOLDING; THERMAL EFFECTS; THERMAL EXPANSION; THERMOPLASTICS; THREE DIMENSIONAL;

EID: 27844608952     PISSN: 1521334X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TEPM.2005.856537     Document Type: Article
Times cited : (15)

References (8)
  • 1
    • 4544267507 scopus 로고    scopus 로고
    • "A new wafer level packaging approach: Encapsulation, metallization, and laser structuring for advanced system in package manufacturing"
    • Montreux, Switzerland, 21.-23.10.2003
    • K.-F. Becker, T. Braun, A. Neumann, A. Ostmann, M. Koch, V. Bader, R. Aschenbrenner, and H. Reichl, "A new wafer level packaging approach: encapsulation, metallization, and laser structuring for advanced system in package manufacturing," in Proc. Polytronic, Montreux, Switzerland, 2003, pp. 225-230. 21.-23.10.2003.
    • (2003) Proc. Polytronic , pp. 225-230
    • Becker, K.-F.1    Braun, T.2    Neumann, A.3    Ostmann, A.4    Koch, M.5    Bader, V.6    Aschenbrenner, R.7    Reichl, H.8
  • 5
    • 18744413439 scopus 로고    scopus 로고
    • "Wafer-level redistribution using fully-additive Cu/Ni/Au metallization"
    • Chicago, IL
    • L. Boettcher, C. Dombrowski, A. Ostmann, and H. Reichl, "Wafer-level redistribution using fully-additive Cu/Ni/Au metallization," in Proc. SMTA, Chicago, IL, 2002, pp. 356-363.
    • (2002) Proc. SMTA , pp. 356-363
    • Boettcher, L.1    Dombrowski, C.2    Ostmann, A.3    Reichl, H.4
  • 7
    • 17044440507 scopus 로고    scopus 로고
    • "Electroless wafer-level redistribution - Further development and new approaches for system integration"
    • Chicago, IL
    • L. Boettcher, A. Ostmann, R. Vieroth, and H. Reichl, "Electroless wafer-level redistribution - further development and new approaches for system integration," in Proc. SMTA, Chicago, IL, 2003, pp. 267-274.
    • (2003) Proc. SMTA , pp. 267-274
    • Boettcher, L.1    Ostmann, A.2    Vieroth, R.3    Reichl, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.