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Volumn 494, Issue 1-2, 2006, Pages 8-12

The influence of deposition parameters on the structure and properties of magnetron-sputtered titania coatings

Author keywords

Degree of unbalance; Pulse frequency

Indexed keywords

COATINGS; FILM GROWTH; MAGNETRON SPUTTERING; OPTICAL DEVICES; REFRACTIVE INDEX; SPUTTER DEPOSITION; TITANIUM DIOXIDE;

EID: 27844588987     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.180     Document Type: Conference Paper
Times cited : (29)

References (12)
  • 12
    • 0003931431 scopus 로고
    • Film Deposition by Plasma Techniques
    • Springer-Verlag Berlin
    • M. Konuma Film Deposition by Plasma Techniques Springer Series on Atoms and Plasmas vol. 10 1992 Springer-Verlag Berlin
    • (1992) Springer Series on Atoms and Plasmas , vol.10
    • Konuma, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.