![]() |
Volumn 494, Issue 1-2, 2006, Pages 8-12
|
The influence of deposition parameters on the structure and properties of magnetron-sputtered titania coatings
|
Author keywords
Degree of unbalance; Pulse frequency
|
Indexed keywords
COATINGS;
FILM GROWTH;
MAGNETRON SPUTTERING;
OPTICAL DEVICES;
REFRACTIVE INDEX;
SPUTTER DEPOSITION;
TITANIUM DIOXIDE;
DEGREE OF UNBALANCE;
DEPOSITION PARAMETERS;
PROCESS VARIABLES;
PULSE FREQUENCY;
THIN FILMS;
|
EID: 27844588987
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2005.08.180 Document Type: Conference Paper |
Times cited : (29)
|
References (12)
|