Chemomechanical polishing of silica and silicon by fluoride- and oxide-based reagents: Identification of a reaction intermediate

Journal of Materials Chemistry

Volumn 6, Issue 2, 1996, Pages 227-232

  Boyle, David S ^a   Winfield, John M ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346043562     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/jm9960600227     Document Type: Article

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