Pressure response of aluminum nitride thin film prepared on silicon substrates

Journal of the Ceramic Society of Japan

Volumn 113, Issue 1322, 2005, Pages 700-702

  Ooishi, Yasunobu ^a   Noma, Hiroaki ^a   Kishi, Kazushi ^a   Ueno, Naohiro ^a   Akiyama, Morito ^a   Kamohara, Toshihiro ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Aluminum nitride; Piezoelectric; Pressure sensor; Thin film

Indexed keywords

MAGNETRON SPUTTERING; SENSORS; SILICON; SINGLE CRYSTALS; SUBSTRATES; THIN FILMS;

ALN SENSORS; PRESSURE SENSORS; SILICON SINGLE CRYSTALS;

ALUMINUM NITRIDE;

EID: 27744569384     PISSN: 09145400     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj.113.700     Document Type: Article

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