Some basics for operating and analyzing data using the thickness shear mode resonator

Analyst

Volumn 130, Issue 11, 2005, Pages 1459-1464

  Kanazawa, Kay Keiji ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON DIOXIDE; WATER;

CONFERENCE PAPER; CRYSTAL; DATA ANALYSIS; ELECTRODE; MASS; RADIOFREQUENCY; REDUCTION; SHEAR STRESS; THICKNESS;

EID: 27744551592     PISSN: 00032654     EISSN: None     Source Type: Journal    
DOI: 10.1039/b506691n     Document Type: Conference Paper

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