Magnetic and transport properties of epitaxial Co2MnSi films

IEEE Transactions on Magnetics

Volumn 41, Issue 10, 2005, Pages 2805-2807

  Wang, W H ^a   Ren, X B ^a   Wu, G H ^b   Przybylski, M ^c,d   Barthel, J ^c   Kirschner, J ^c  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b INSTITUTE OF PHYSICS   (China)

^c MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^d AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

Author keywords

Half metal; Heusler alloys; Magnetic properties

Indexed keywords

EPITAXIAL GROWTH; HEATING; LOW TEMPERATURE EFFECTS; MAGNETIC ANISOTROPY; MAGNETIC PROPERTIES; MAGNETIZATION; MAGNETORESISTANCE; PULSED LASER DEPOSITION; SEMICONDUCTOR MATERIALS; SINGLE CRYSTALS; SUBSTRATES; THIN FILMS;

CURIE TEMPERATURE; HALF METALS; HEUSLER ALLOYS; METALLIC BEHAVIOR;

COBALT COMPOUNDS;

EID: 27744539676     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2005.854833     Document Type: Article

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