Kohlrausch relaxations: New aspects about the everlasting story

IEEE Transactions on Dielectrics and Electrical Insulation

Volumn 12, Issue 4, 2005, Pages 709-718

  Kliem, H ^a  

^a SAARLAND UNIVERSITY   (Germany)

Author keywords

Dielectric polarization; Dipolar interaction; Distribution function; Electrodes; Insulators; Kohlrausch relaxations; Monte Carlo methods; Relaxation processes

Indexed keywords

DIELECTRIC POLARIZATION; DIPOLAR INTEARCTION; DISTRIBUTION FUNCTION; KOHLRAUSCH RELAXATIONS;

CAPACITORS; ELECTRIC POWER SYSTEMS; ELECTRODES; ELECTROLYSIS; MONTE CARLO METHODS; NATURAL FREQUENCIES; RELAXATION PROCESSES;

DIELECTRIC MATERIALS;

EID: 27744514498     PISSN: 10709878     EISSN: None     Source Type: Journal    
DOI: 10.1109/TDEI.2005.1511096     Document Type: Article

References (33)

1. R. Kohlrausch, "Theorie des elektrischen Rückstandes in der Leidener Flasche", Pogg. Ann., Vol. 91, pp. 56-82, pp. 179-214, 1854.
2. W. Weber, "De fili bomby cini vi eleastica", Gottingae, 1841.
3. F. C. Aris and T. J. Lewis, "Steady and transient conduction processes in anodic tantalum oxide", J. Phys. D., Vol. 6, pp. 1067-1083, 1973.
4. 2", J. Appl. Phys., Vol. 55, pp. 1130-1131, 1984.
5. J. Takase and A. Odajima, "γ-ray radiation-induced changes in switching current of PVDF", Jap. J. Appl. Phys., Vol. 22, pp. L318-L320, 1983.
6. M. Sayer, A. Mansingh, J. M. Reyes and G. Rosenblatt, "Polaronic hopping conduction in vanadium phosphate glasses", J. Appl. Phys., Vol. 42, pp. 2857-2864, 1971.
7. H. Kliem, B. Schumacher and G. Arlt, "Transient current measurements in polyimide", IEEE CEIDP, pp. 168-173, 1986.
8. Hiroshi Adachi and Yukio Shibata, "Asymmetric two-site hopping model for high-electric-field-excited thermally stimulated current in evaporated silicon oxide films", J. Phys. D, Vol. 8, pp. 1120-1132, 1975.
9. A. de Polignac and M. Jourdain, "Low frequency dispersion in evaporated silicon oxide films", Thin Sol. Films, Vol. 71, pp. 189-199, 1980.
10. 2 thin films", J. Appl. Phys., Vol. 90, pp. 1941-1949, 2001.
11. A. Wagner and H. Kliem, "Dispersive space charge relaxation in solid polymer electrolytes, I. Experimental system polyethylene oxide", J. Appl. Phys., Vol. 91, issue 10, 6630-6637, 2002.
12. H. Kliem and G. Arlt, "On the Curie-von Schweidler law in aluminum oxide", IEEE CEIDP, pp. 495-503, 1984.
13. S. Manzini and F. Volontà, "Charge transport and trapping in silicon nitride-silicon dioxide dielectric double layers", J. Appl. Phys., Vol. 58, pp. 4300-4306, 1985.
14. M. Homann and H. Kliem, "Relaxational polarization and charge injection in thin films of silicon nitride", Microelectronics J., Vol. 25, pp.559-566, 1994.
15. R. Street and J. C. Wodley, "A study of magnetic viscosity", Proc. Phys. Soc., Vol. A62, pp. 562-572, 1949.
16. A. K. Jonscher, "The Universal Dielectric Response", Nature, Vol. 267, pp. 673-679, 1977.
17. H. Fröhlich, Theory of Dielectrics, Oxford University Press, 1949.
18. J. R. Jameson, W. Harrison, P. B. Griffin and J. D. Plummer, "Double-well model of dielectric relaxation current", Appl. Phys. Lett., Vol. 84, pp. 3489-3491, 2004.
19. H. Reisinger, G. Steinlesberger, S. Jakschik, M. Gutsche, T. Hecht, M. Leonhard, U. Schröder, H. Seidl and D. Schumann, "A comparative study of relaxation losses in alternative dielectrics", IEDM 01, pp. 267-270, 2001.
20. T. J. Lewis, "The dielectric behavior of Non-crystalline Solids", Dielectric and Related Molecular Processes, Vol. 3, pp. 186-218, 1977.
21. H. Kliem, "Dielectric Small Signal Response by Protons in Amorphous Insulators", IEEE Trans. Electr. Insul., Vol. 24, pp. 185-197, 1989.
22. M. Kühn and H. Kliem, "Simulating solid dielectrics using Monte-Carlos methods", IEEE ICSD, Toulouse, Vol. 2, pp. 554-557, 2004.
23. M. Kühn and H. Kliem, "Modeling non-exponential relaxations in interacting dipole systems", accepted to the "Annual Conference of the Dielectrics Group", Cambridge 2005.
24. A. Wagner and H. Kliem, "Dispersive ionic space charge relaxation in solid polymer electrolytes, II. Model and simulation", J. Appl. Phys., Vol. 91, pp. 6638-6649, 2002.
25. B. Martin and H. Kliem, "The role of image charges in solid electrolyte capacitors", IEEE ICSD 2004, Toulouse, Vol. 1, pp. 17-20, 2004.
26. M. Pollak and T. H. Geballe, "Low-frequency conductivity due to hopping processes in silicon", Phys. Rev., Vol. 122, pp. 1742-1753, 1961.
27. 3 molecules", J. Chem. Phys., Vol. 3, pp. 136-138, 1935.
28. R. Janoschek in The Hydrogen Bond, edited by P. Schuster, G. Zundel, C. Sandorfy, North Holland, pp. 165-216, 1976.
29. W. A. Lanford, R. S. Alwitt and C. K. Dyer, "Hydrogen profiles of anodic aluminum oxide films", J. Electrochem. Soc., Vol. 127, pp. 405-411, 1980.
30. F. H. P. M. Habraken, R. H. G. Tijhaar and W. F. van der Weg, "Hydrogen in low-pressure chemical-vapour-deposited silicon (oxy)nitride films", J. Appl. Phys., Vol. 59, pp. 447-453, 1986.
31. 2 thin films in dependence on the ambient hydrogen pressure", J. Appl. Phys., Vol. 93, pp. 1684-1690, 2003.
32. N. Farag and H. Kliem, "Ferroelectricity in systems of induced and permanent dipoles: A Monte Carlo study", J. Appl. Phys., Vol. 90, pp. 5713-5720, 2001.
33. F. Jondral and A. Wiesler, "Grundlagen der Wahrscheinlichkeitsrechnung und stochastischer Prozesse", Stuttgart Leipzig, B. G. Teubner, 2000.