Size-reduced silicon nanowires: Fabrication and electrical characterization

Materials Science and Engineering C

Volumn 25, Issue 5-8, 2005, Pages 733-737

  Juhasz, Robert ^a   Kylmänen, Kai ^a   Galeckas, Augustinas ^a   Linnros, Jan ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

Electrochemical etching of silicon; Electron beam lithography; Hydrofluoric acid; Micro electrochemical cell; Silicon nanowires; Size reduction

Indexed keywords

CHARACTERIZATION; ELECTRON BEAM LITHOGRAPHY; HYDROFLUORIC ACID; PLASMA ETCHING; SILICON; SILICON ON INSULATOR TECHNOLOGY;

ELECTROCHEMICAL DEPOSITION OF SILICON; MICRO-ELECTROCHEMICAL CELLS; SILICON NANOWIRES; SIZE-REDUCTION;

NANOSTRUCTURED MATERIALS;

EID: 27744488489     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msec.2005.06.036     Document Type: Article

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