30-nm scale fabrication of magnetic tunnel junctions using EB assisted CVD hard masks

IEEE Transactions on Magnetics

Volumn 41, Issue 10, 2005, Pages 3607-3609

  Isogami, Shinji ^a   Tsunoda, Masakiyo ^a   Takahashi, Migaku ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Argon ion milling; Chemical vapor deposition (CVD); Magnetic tunnel junctions (MTJs); Scanning electron microscope (SEM)

Indexed keywords

ARGON; CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRON BEAMS; IONS; MASKS; SCANNING ELECTRON MICROSCOPY;

ARGON ION MILLING; CARBON PILLAR; FILM PLANE; MAGNETIC TUNNEL JUNCTIONS (MTJ);

SEMICONDUCTOR JUNCTIONS;

EID: 27744446511     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2005.854786     Document Type: Article

References (5)

1. M. Takagishi, K. Koi, M. Yoshikawa, T. Funayama, H. Iwasaki, and M. Sahashi, IEEE. Trans. Magn., vol. 38, pp. 2277-2282, Sep. 2002.
2. H. Kubota, M. Hamada, Y. Ando, and T. Miyazaki, J. Appl. Phys., vol. 93, p. 8370, 2003.
3. D. Watanabe, H. Kubota, Y. Ando, and T. Miyazaki, J. Magn. Soc. Jpn., vol. 28, p. 569, 2004.
4. S. Yoshimura, T. Shoyama, T. Nozawa, M. Tsunoda, and M. Takahashi, IEEE Trans. Magn., vol. 40, pp. 2290-2292, 2004.
5. K. Nishikawa, M. Tsunoda, S. Ogata, and M. Takahashi, IEEE Trans. Magn., vol. 38, pp. 2718-2720, Sep. 2002.