Reduction of ordering temperature of FePt-Al2O3 thin films by N2 addition during sputtering

Chinese Physics Letters

Volumn 22, Issue 11, 2005, Pages 2899-2902

  Cao, Jiang Wei ^a   Katayama, N ^b   Zheng, Yang ^a   Wei, Fu Lin ^a   Matsumoto, M ^b   Morisako, A ^b   Liu, Xiao Xi ^b   Takei, S ^b  

^a LANZHOU UNIVERSITY   (China)

^b SHINSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ANNEALING; BINARY ALLOYS; MICROSTRUCTURE; THIN FILMS;

% REDUCTIONS; FEPT PHASE; ORDERING TEMPERATURE; PHASE FORMS; POSTANNEALING; RANDOM ORIENTATIONS; THIN-FILMS;

SPUTTERING;

EID: 27644596698     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/22/11/048     Document Type: Article

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