Effects of W and Ti on the grain size and coercivity of Fe50Pt50 thin films

Journal of Magnetism and Magnetic Materials

Volumn 209, Issue 1-3, 2000, Pages 100-102

  Kuo, Chih Ming ^a   Kuo, P C ^a   Hsu, Wei Chih ^a   Li, Chao Te ^a   Sun, An Cheng ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COERCIVE FORCE; DOPING (ADDITIVES); GRAIN SIZE AND SHAPE; IRON ALLOYS; MAGNETRON SPUTTERING; METALLIC FILMS; POLYCRYSTALLINE MATERIALS; SILICON WAFERS; SPUTTER DEPOSITION; TITANIUM; TUNGSTEN;

IRON PLATINUM ALLOY;

MAGNETIC THIN FILMS;

EID: 0034135352     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(99)00655-1     Document Type: Article

References (3)

1. Zhang B., Soffa W.A. IEEE Trans. Magn. MAG-26:1990;1388.
2. Inomata K., Sawa T., Hashimoto S. J. Appl. Phys. 64:1988;2537.
3. Kuo C.M., Kuo P.C., Wu H.C., Yao Y.D., Lin C.H. J. Appl. Phys. 85:1999;4886.