A mathematical description of the kinetics of the electrophoretic deposition process for Al 2O 3-based suspensions

Journal of the American Ceramic Society

Volumn 88, Issue 8, 2005, Pages 2036-2039

  Anné, Guy ^a   Vanmeensel, Kim ^a   Vleugels, Jef ^a   Van Der Biest, Omer ^a,b  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b AMERICAN CERAMIC SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT FLOW; ELECTROPHORETIC DEPOSITION; ON-LINE MEASUREMENTS; POTENTIAL DROP;

DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC FIELDS; ELECTROPHORESIS; KETONES; KINETIC THEORY; SUSPENSIONS (FLUIDS);

ALUMINA;

EID: 27644514549     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2005.00387.x     Document Type: Article

References (7)

1. O. Van der Biest and L. Vandeperre, "Electrophoretic Deposition of Materials," Annu. Rev. Mater. Sci.,29, 327-52 (1999).
2. H. Hamaker, Trans Faraday Soc.,36, 279 (1940).
3. Z. Zhang, Y. Huang, and E Jiang, "Electrophoretic Deposition Forming of SiC-TZP Composites in Non-Aqueous Sol media," J. Am. Ceram. Sot:, 77 [7] 1946-9 (1994).
4. P. M. Biesheuvel and H. Verwey, "Theory of Cast Formation in Electrophoretic Deposition," J. Am. Ceram. Soc.,82 [6] 1451-5 (1999).
5. G. Anné, K. Vanmeensel, J. Vleugels, and O. Van der Biest, "Influence of the Suspension Composition on the Electric Field and Deposition Rate During Electrophoretic Deposition," Colloids Surf. A: Physicochem. Eng. Aspects, 245, 35-9 (2004).
6. 3 Based X7R dielectric Thick Films." J. Am. Ceram. Soc.,83 [10] 2417-22 (2000).
7. G. Kynch, "A Theory of Sedimentation," Trans. Faraday Soc.,48, 166-76 (1952).