Anodizing behavior of aluminum foil patterned with SiO2 mask

Journal of the Electrochemical Society

Volumn 152, Issue 10, 2005, Pages

  Zhao, Xiaowei ^a   Jiang, Peng ^b   Xie, Sishen ^a,b   Liu, Lifeng ^a   Zhou, Weiya ^a   Gao, Yan ^a   Song, Li ^a   Wang, Jianxiong ^a   Liu, Dongfang ^a   Dou, Xinyuan ^a   Luo, Shudong ^a   Zhang, Zengxing ^a   Xiang, Yanjuan ^a   Wang, Gang ^a  

^a INSTITUTE OF PHYSICS   (China)

^b NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ALUMINUM FOIL; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SILICA;

ANODIC ALUMINUM OXIDE (AAO);

ANODIC OXIDATION;

EID: 27644465255     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2013187     Document Type: Article

References (29)

1. M. Steinhart, R. B. Wehrspohn, U. Gösele, and J. H. Wendorff, Angew. Chem., Int. Ed. Engl., 43, 1334 (2004).
2. Y. Li, E. R. Holland, and P. R. Wilshaw, J. Vac. Sci. Technol. B, 18, 944 (2000).
3. S. Rahman and H. Yang, Nano Lett., 3, 439 (2003).
4. A. Yamaguchi, F. Uejo, T. Yoda, T. Uchida, Y. Tanamura, T. Yamashita, and N. Teramae, Nat. Mater., 3, 337 (2004).
5. F. Keller, M. S. Hunter, and D. L. Robinson, J. Electrochem. Soc., 100, 411 (1953).
6. B. B. Lakshmi, P. K. Dorhout, and C. R. Martin, Chem. Mater., 9, 857 (1997).
7. J. Li, C. Papadopoulos, and J. Xu, Nature (London), 402, 253 (1999).
8. S. R. Nicewarner-Peña, R. G. Freeman, B. D. Reiss, L. He, D. J. Peña, I. D. Walton, R. Cromer, C. D. Keating, and M. J. Natan, Science, 294, 137 (2001).
9. T. T. Xu, F. T. Fisher, L. C. Brinson, and R. S. Ruoff, Nano Lett., 3, 1135 (2003).
10. E. J. Bae, W. B. Choi, K. S. Jeong, J. U. Chu, G. S. Park, S. Song, and I. K. Yoo, Adv. Mater. (Weinheim, Ger.), 14, 277 (2002).
11. W. B. Choi, B. H. Cheong, J. J. Kim, J. Chu, and E. J. Bae, Adv. Funct. Mater., 13, 80 (2003).
12. A. P. Li, F. Müller, A. Birner, K. Nielsch, and U. Gösele, Adv. Mater. (Weinhelm, Ger.), 11, 483 (1999).
13. S. A. Miller, V. Y. Young, and C. R. Martin, J. Am. Chem. Soc., 123, 12335 (2001).
14. H. Masuda, H. Yamada, M. Satoh, and H. Asoh, Appl. Phys. Lett., 71, 2770 (1997).
15. H. Masuda, H. Asoh, M. Watanabe, K. Nishio, M. Nakao, and T. Tamamura, Adv. Mater. (Weinheim, Ger.), 13, 189 (2001).
16. J. C. Yan, G. V. Rama Rao, M. Barela, D. A. Brevnov, Y. B. Jiang, H. F. Xu, G. P. Lǒpez, and P. B. Atanassov, Adv. Mater. (Weinheim, Ger.), 15, 2015 (2003).
17. D. A. Brevnov, M. Barela, M. E. Piyasena, G. P. Lǒpez, and P. B. Atanassov, Chem. Mater., 16, 682 (2004).
18. J. P. O'Sullivan and G. C. Wood, Proc. R. Soc. London, Ser. A, 317, 511 (1970).
19. J. Siejka and C. Ortega, J. Electrochem. Soc., 124, 883 (1977).
20. G. E. Thompson and G. C. Wood, Nature (London), 290, 230 (1981).
21. V. P. Parkhutik and V. I. Shershulsky, J. Phys. D, 25, 1258 (1992).
22. M. Zhang, Y. Bando, and K. Wada, J. Mater. Res., 15, 387 (2000).
23. H. Masuda and K. Fukuda, Science, 268, 1466 (1995).
24. O. Jessensky, F. Müller, and U. Gösele, J., Electrochem. Soc., 145, 3735 (1998).
25. T. A. Renshaw, J. Electrochem. Soc., 108, 185 (1964).
26. H. Takahashi, M. Nagayama, H. Akahori, and A. Kitahara, J. Electro Microscopy. Jpn., 22, 149 (1973).
27. J. W. Diggle, T. C. Downie, and C. W. Goulding, J. Electrochem. Soc., 116, 737 (1969).
28. G. E. Thompson and G. C. Wood, Nature (London), 290, 230 (1981).
29. V. P. Parkhutik and V. I. Shershulsky, J. Phys. D, 25, 1258 (1992).