Yield strength of α-silicon nitride at high pressure and high temperature

Journal of the American Ceramic Society

Volumn 88, Issue 4, 2005, Pages 903-906

  Qian, J ^a   Pantea, C ^a   Zhang, J ^a   Daemen, L L ^a   Zhao, Y ^a   Tang, M ^b   Uchida, T ^c   Wang, Y ^c  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF CHICAGO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION PEAKS; ENERGY-DISPERSIVE DIFFRACTION; LATTICE STRAIN; STRAIN SATURATION;

COMPACTION; CRYSTAL LATTICES; ELECTROMAGNETIC WAVE DIFFRACTION; GRAIN SIZE AND SHAPE; HEATING; HIGH TEMPERATURE EFFECTS; PRESSURE EFFECTS; STRAIN; STRESS RELAXATION; YIELD STRESS;

SILICON NITRIDE;

EID: 27644455249     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2005.00163.x     Document Type: Article

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