Next generation pressure sensors in surface micromachining technology

Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05

Volumn 1, Issue , 2005, Pages 35-36

  Lammel, G ^a   Armbruster, S ^a   Schelling, C ^a   Benzel, H ^a   Brasas, J ^a   Illing, M ^a   Gampp, R ^a   Senz, V ^a   Schafer F ^a   Finkbeiner, S ^a  

^a ROBERT BOSCH GMBH   (Germany)

Author keywords

Pressure sensor; Surface micromaching

Indexed keywords

ELECTRONIC PROCESSES; MEMBRANE FABRICATION; PRESSURE SENSORS; SURFACE MICROMACHINING TECHNOLOGY;

CRYSTALLINE MATERIALS; ELECTROCHEMISTRY; ETCHING; INTEGRATED CIRCUITS; MEMBRANES; MICROELECTROMECHANICAL DEVICES; POROUS SILICON; SENSORS; SURFACES;

MICROMACHINING;

EID: 27544501338     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2005.1496352     Document Type: Conference Paper

References (1)

1. S. Armbruster, F. Schäfer, G. Lammel, H. Artmann, C. Schelling, H. Benzel, S. Finkbeiner, F. Lärmer, P. Ruther, and O. Paul "A novel micromachining process for the fabrication of monocrystalline Si-membranes using porous silicon", Digest of Technical Papers Transducers '03, 2003, pp. 246.