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Volumn 1, Issue , 2005, Pages 413-416

Fabrication of miniaturized electron beam system

Author keywords

Anodic bonding; e beam lithography; Microcolumn

Indexed keywords

DIFFRACTION; ELECTRODES; GLASS; MICROELECTROMECHANICAL DEVICES; SILICON WAFERS;

EID: 27544495097     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (2)
  • 1
    • 0000731720 scopus 로고
    • Arrayed miniature electron beam columns for high throughput sub-100nm lithography
    • T. H. P Chang, D. P. Kern and L. P. Muray, "Arrayed miniature electron beam columns for high throughput sub-100nm lithography," J. Vac. Sci. Technol., B 10(6), 2743 (1992)
    • (1992) J. Vac. Sci. Technol., B , vol.10 , Issue.6 , pp. 2743
    • Chang, T.H.P.1    Kern, D.P.2    Muray, L.P.3
  • 2
    • 0042362144 scopus 로고    scopus 로고
    • The novel deflector for multi arrayed microcolumn using Microelectromechanical System (MEMS) technology
    • H. Kim, C. Han and K. Chun, "The Novel Deflector for Multi Arrayed Microcolumn Using Microelectromechanical System (MEMS) Technology," Jpn. J. Appl. Phys., 42, 4084 (2003)
    • (2003) Jpn. J. Appl. Phys. , vol.42 , pp. 4084
    • Kim, H.1    Han, C.2    Chun, K.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.