RBS and ERD characterization of SiON films for optical waveguide applications

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 240, Issue 1-2, 2005, Pages 440-444

  Climent Font, A ^a,b   Paszti F ^c   Munoz Martin A ^b   Ruiz, E ^a   Garrido, J ^a   Pernas, P L ^a  

^a UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

^b CENTRO DE MICROANÁLISIS DE MATERIALES   (Spain)

^c WIGNER RESEARCH CENTRE FOR PHYSICS   (Hungary)

Author keywords

ECR PECVD; ERDA; Optical waveguides; RBS; SiON

Indexed keywords

CYCLOTRON RESONANCE; DEPOSITION; LIGHT ABSORPTION; OPTICAL COMMUNICATION; OPTOELECTRONIC DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; WAVEGUIDES;

ACTIVE CHANNEL WAVEGUIDES; DEUTERONAMMONIA (ND); ECR-PECVD; ERDA; SION;

THIN FILMS;

EID: 27344446809     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.06.142     Document Type: Conference Paper

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