Large area etching for porous semiconductors

Physica Status Solidi C: Conferences

Volumn 2, Issue 9, 2005, Pages 3339-3343

  Carstensen, J ^a   Christophersen, M ^a   Lolkes S ^a   Ossei Wusu, E ^a   Bahr, J ^a   Langa, S ^a   Popkirov, G ^a   Foll H ^a  

^a UNIVERSITY OF KIEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; POROUS MATERIALS; SEMICONDUCTOR MATERIALS; SILICON WAFERS;

ELECTROCHEMICAL ETCHING; MACROPORES; POROUS SEMICONDUCTORS;

ETCHING;

EID: 27344443264     PISSN: 16101634     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1002/pssc.200461159     Document Type: Conference Paper

References (7)

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3. V. Lehmann, Thin Solid Films 225, 1 (1995).
4. V. Lehmann and S. Rönnebeck, in: Technical Digest of the 14th IEEE Internat. Conf. on Micro Electro Mechanical Systems, 84, Interlaken (2001).
5. L. Ohlsen, these Proceedings.
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7. ET&TE Etch and Technology GmbH, http://www.et-te.com.