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Volumn 240, Issue 1-2, 2005, Pages 137-141
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Application of ion beam analysis for the control of the improvement of the oxidation resistance of TiAl at 900 °c in air by fluorine ion implantation and HF-treatment
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Author keywords
Fluorine depth profiles; Halogen effect; HF treatment; Ion beam analysis; Ion implantation; Titanium aluminides
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Indexed keywords
AIR;
ALLOYING;
FLUORINE;
HALOGEN COMPOUNDS;
ION IMPLANTATION;
OXIDATION RESISTANCE;
TITANIUM COMPOUNDS;
FLUORINE DEPTH PROFILES;
HALOGEN EFFECT;
HF TREATMENT;
ION BEAM ANALYSIS;
TITANIUM ALUMINIDES;
ION BEAMS;
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EID: 27344441942
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2005.06.102 Document Type: Conference Paper |
Times cited : (39)
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References (12)
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