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Volumn 240, Issue 1-2, 2005, Pages 137-141

Application of ion beam analysis for the control of the improvement of the oxidation resistance of TiAl at 900 °c in air by fluorine ion implantation and HF-treatment

Author keywords

Fluorine depth profiles; Halogen effect; HF treatment; Ion beam analysis; Ion implantation; Titanium aluminides

Indexed keywords

AIR; ALLOYING; FLUORINE; HALOGEN COMPOUNDS; ION IMPLANTATION; OXIDATION RESISTANCE; TITANIUM COMPOUNDS;

EID: 27344441942     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.06.102     Document Type: Conference Paper
Times cited : (39)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.