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Volumn 240, Issue 1-2, 2005, Pages 425-428
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Inter-diffusion study of rhodium and tantalum by RBS
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Author keywords
Diffusion barrier; High temperature; RBS; Rh
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Indexed keywords
ANNEALING;
DIFFUSION;
HIGH TEMPERATURE EFFECTS;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SYNTHESIS (CHEMICAL);
DIFFUSION BARRIER;
HIGH TEMPERATURE APPLICATIONS;
INTER-DIFFUSION;
RHODIUM ALLOYS;
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EID: 27344435052
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2005.06.139 Document Type: Conference Paper |
Times cited : (4)
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References (11)
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