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Volumn 240, Issue 1-2, 2005, Pages 425-428

Inter-diffusion study of rhodium and tantalum by RBS

Author keywords

Diffusion barrier; High temperature; RBS; Rh

Indexed keywords

ANNEALING; DIFFUSION; HIGH TEMPERATURE EFFECTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SYNTHESIS (CHEMICAL);

EID: 27344435052     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.06.139     Document Type: Conference Paper
Times cited : (4)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.