Unbalanced magnetron sputtered Si-Al coatings: Plasma conditions and film properties versus sample bias voltage

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 735-741

  Jacobs, M ^a   Terwagne, G ^a   Roquiny, Ph ^a   Bodart, F ^a  

^a UNIVERSITY OF NAMUR   (Belgium)

Author keywords

Coatings; Magnetron sputtering; PVD; SixAly; Sialon; Thin film

Indexed keywords

COMPOSITION EFFECTS; MAGNETRON SPUTTERING; METALLIC FILMS; PLASMA DENSITY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON COMPOUNDS; SPUTTER DEPOSITION; STOICHIOMETRY; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

GLASSY CARBON; SIALON;

VAPOR DEPOSITION;

EID: 0039171146     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00278-9     Document Type: Article

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