Effect of the plasma surface treatment on an anatase TiO2 film

Journal of Materials Science: Materials in Electronics

Volumn 16, Issue 10, 2005, Pages 645-648

  Chiba, Yoshiaki ^a   Kokai, Hideki ^a   Kashiwagi, Kunihiro ^a  

^a TOYO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; ION BOMBARDMENT; LIGHT ABSORPTION; OPTICAL PROPERTIES; PHOTOCATALYSIS; PLASMA APPLICATIONS; SURFACE TREATMENT; THIN FILMS; TITANATE MINERALS;

ANATASE; ELECTROCONDUCTIVITY; PLASMA SURFACE TREATMENT; REACTIVE ION PLATING;

TITANIUM DIOXIDE;

EID: 27244435553     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-005-3739-5     Document Type: Article

References (10)

1. A. FUJISHIMA and K. HONDA, Nature 238 (1972) 37. 10.1038/238037a0
2. S. K. ZHENG, T. M. WANG and C. WENG, J. Mater. Sci. Lett. 21 (2002) 1465. 10.1023/A:1019987304888
3. Y. MA, X. ZHANG, Z. GUAN, Y. CAO and J. YAO, J. Mater. Res. 16 (10) 2001.
4. R. ASAHI, T. MORIKAWA, T. OHWAKI, K. AOKI and Y. TAGA, Science 293 (2001) 269. 10.1126/science.1061051
5. W. CHOI, A. TERMIN and M. R. HOFFMANN, J. Phys. Chem. 98 (1994) 13669. 10.1021/j100102a038
6. T. MORIKAWA, R. ASAHI, T. OHWAKI, K. AOKI and Y. TAGA, Jpn. J. Appl. Phys. 40 (2001) L561. 10.1143/JJAP.40.L561
7. S. SUGIHARA, Japan patent No. 2001-212457, 7 Aug. 2001.
8. K. TAKEUCHI, I. NAKAMURA, O. MATSUMOTO, S. SUGIHARA, M. ANDO and T. IHARA, Chem. Lett. (2000) 1354.
9. R. F. BADDOUR R. S. TINMINS 1967 "The Application of Plasma to Chemical Processing" (MIT Press, Cambridge)
10. K. OUMI, K. KASHIWAGI, H. KOKAI and Y. MURAYAMA, Jpn. J. Appl. Phys. 40 (2001) 468. 10.1143/JJAP.40.L468