Characterisation of PVD TiCN layers by physical and electrochemical methods

Surface Engineering

Volumn 21, Issue 2, 2005, Pages 144-150

  Sienna, L F ^a,c   Achete, C A ^a   Hirsch, T ^b   Mattos, O ^a  

^a FEDERAL UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^b STIFTUNG INSTITUT FÜR WERKSTOFFTECHNIK   (Germany)

^c STATE UNIVERSITY OF RIO DE JANEIRO   (Brazil)

Author keywords

Electrochemical impedance spectroscopy; Hard coatings; X ray diffraction technique

Indexed keywords

CRYSTAL LATTICES; ELECTROCHEMISTRY; MAGNETRON SPUTTERING; METHANE; NITROGEN; PHYSICAL VAPOR DEPOSITION; RESIDUAL STRESSES; X RAY DIFFRACTION ANALYSIS;

CN-TI BONDS; COATING COMPOSITION; COATING-SUBSTRATE SYSTEMS; HARD COATINGS;

TITANIUM COMPOUNDS;

EID: 27144553792     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/174329405X40876     Document Type: Article

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