Resistivity and Seebeck coefficient measurements of a bismuth microwire array

Physica B: Condensed Matter

Volumn 368, Issue 1-4, 2005, Pages 163-167

  Ishikawa, Y ^a   Hasegawa, Y ^a   Morita, H ^b   Kurokouchi, A ^b   Wada, K ^b   Komine, T ^c   Nakamura, H ^d  

^a SAITAMA UNIVERSITY   (Japan)

^b Saitama Industrial Technology Center   (Japan)

^c IBARAKI UNIVERSITY   (Japan)

^d NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

Author keywords

Contact resistance; Interlayer; Ion plating method; Microwire array

Indexed keywords

BISMUTH; ELECTRODES; POLYCRYSTALLINE MATERIALS; SEEBECK EFFECT; THIN FILMS;

CONTACT RESISTANCE; INTERLAYERS; ION PLATING METHOD;

MICROWAVES;

EID: 26444553594     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2005.07.012     Document Type: Article

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