The rf-power dependences of the deposition rate, the hardness and the corrosion-resistance of the chromium nitride film deposited by using a dual ion beam sputtering system

Materials Chemistry and Physics

Volumn 95, Issue 1, 2006, Pages 164-168

  Lim, Jongmin ^a   Lee, Chongmu ^a  

^a Inha University   (South Korea)

Author keywords

Chromium nitride; Corrosion resistance; Deposition rate; Hardness; Sputtering

Indexed keywords

CHROMIUM COMPOUNDS; CORROSION RESISTANCE; HARDNESS; ION BEAMS; SPUTTERING; SURFACE ROUGHNESS; TUMORS; X RAY DIFFRACTION ANALYSIS;

ARGON ION BEAMS; CHROMIUM NITRIDE; DEPOSITION RATE; ION BEAM SPUTTERING;

CHROMIUM PLATING;

EID: 26444515966     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2005.05.039     Document Type: Review

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