Experimental study on intermediate and gradient index dielectric thin films by a novel reactive sputtering method

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 5, 1997, Pages 2670-2672

  Tang, Q ^a   Ogura, S ^a   Yamasaki, M ^b   Kikuchi, K ^b  

^a KOBE DESIGN UNIVERSITY   (Japan)

^b Shincron Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031536038     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580940     Document Type: Article

References (9)

1. L. I. Epstein, J. Opt. Soc. Am. 42, 806 (1952).
2. B. G. Bovaud, Appl. Opt. 32, 5427 (1993).
3. S. P. Heuer et al., Proceedings of the Optical Interference coating Symposium, Tucson, Arizona, 1992 (unpublished), Vol. 15, p. 122.
4. G. A. Al-Jumaily et al., J. Vac. Sci. Technol. A 7, 2280 (1989).
5. S. C. Miller and K. K. Mackamul, Proceedings of the Optical Interference Coatings Symposium, Tucson, Arizona, 1995 (unpublished), Vol. 17, p. 172.
6. Shincron Co., Ltd., Japan Patent # pending, Laid open Appl. No. 19518 (1994) and Appl. No. 337931 (1996).
7. J. Tamoto and K. Okada, JTTAS Sputtering and Plasma Process (Japanese) 10, 35 (1995).
8. R. Swanepoel, J. Phys. E 16, 1214 (1983).
9. R. Swanepoel, J. Phys. E 17, 896 (1984).