Study on the Li and B Co-doped diamond thin film

Journal of Materials Science

Volumn 40, Issue 20, 2005, Pages 5549-5551

  Lee, W S ^a   Yu, Jin ^a   Lee, T Y ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Hanbat National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; COBALT; DIAMOND FILMS; DOPING (ADDITIVES); HALL EFFECT; LITHIUM; PLASMAS;

ELECTRONIC PERFORMANCE; HOT FILAMENT CHEMICAL VAPORIZED DEPOSITION (HFCVD); PLASMA TREATMENT;

THIN FILMS;

EID: 26444463075     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-005-4548-1     Document Type: Conference Paper

References (19)

1. LAWRENCE S. PAN and DON R. KANIA, "Diamond: Electronic Properties and Applications" (Kluwer Academic Publishers, MA, USA, 1995) p. 156.
2. G. POPOVICI and M. A. PRELAS, Diam. Relat. Mater. 4 (1995) 1305.
3. M. HASEGAWA, T. TERAJI and S. KOIZUMI, Appl. Phys. Lett. 79(19) (2001) 3068.
4. E. GHEERAERT, N. CASANOVA, A. JAJANI, A. DENEURILLE, E. BUSTARRET, J. A. GARRIDO, C. E. NEBE and M. STUTZMANN, Diam. Relat. Mater. 11 (2000) 289.
5. K. OKUMURA, J. MORT and M. MACHONKIN, Appl. Phys. Lett. 57(18) (1990) 1907.
6. S. A. KAJIHARA, A. AUTONELLI and J. BERUHOLC, Phys. Rev. Lett. 66(15) (1991) 2010.
7. G. POPOVICI, M. A. PRELAS, T. SUNG, S. KHASAWINAH, A. A. MELNIKOV, V. S. VARISCHANKO, A. ZAITSEV and W. R. FAHRNER, Diam. Relat. Mater. 4 (1995) 877.
8. R. KALISH, Diam. Relat. Mater. 10 (2001) 1749.
9. J. G. KIM, JIN Y U and W. S. LEE, Super Carbon (1998) 141.
10. J. G. KIM and JIN YU, Scripta. Mater. 39(6) (1998) 807.
11. T. H. BORST and O. WEIS, Diam. Relat. Mater. 4 (1995) 948.
12. D. HONG and M. ASLAM, J. Vac. Sci. Technol. B 13(2) (1995) 427.
13. Y. BAR-YAM and T. D. MOUSTAKAS, Nature 342 (1989) 786.
14. KOICHI MIYATA and DAVID L. DREIFUS, Jpn. J. Appl. Phys. 33 (1994) 4526.
15. R. RAMESHAM, T. ROPPEL and C. ELLIS, J. Electrochem. Soc. 138(10) (1991) 2981.
16. K. OKANO, H. NARUKI, Y. AKIBA, T. KUROSU, M. IIDA and Y. HIROSE, Jpn. J. Appl. Phys. 27(2) (1988) L173.
17. Y. DAI, B. HUANG and D. DAI, Diam. Relat. Mater. 12 (2003) 15.
18. C. A. SPINDT, I. BRODIE, L. HUMPHREY and E. R. WESTERBERG, J. Appl. Phys. 47(12) (1976) 5246.
19. H. F. GRAY, Inform. Display 3 (1993) 9.