Growth of highly curved Al 1-xin xN nanocrystals

Physica Status Solidi (A) Applications and Materials Science

Volumn 202, Issue 7, 2005, Pages

  Radnóczi, György Z ^a,b   Seppänen, Timo ^a   Pécz, Béla ^b   Hultman, Lars ^a   Birch, Jens ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL THIN FILMS; LATTICE CURVATURE; WHISKERS;

CRYSTAL STRUCTURE; EPITAXIAL GROWTH; LATTICE CONSTANTS; NANOSTRUCTURED MATERIALS; PHYSICAL VAPOR DEPOSITION; SOLID SOLUTIONS; THIN FILMS;

ALUMINUM COMPOUNDS;

EID: 25444523221     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200510024     Document Type: Article

References (10)

1. V. Yu. Kolosov and A. R. Thölén, Acta Mater. 48, 1829 (2000).
2. O. G. Schmidt and K. Eberl, Nature 410, 168 (2001).
3. V. Ya. Prinz. V. A. Seleznev, A. K. Gutakovsky, A. V. Chehovskiy, V. V. Preobrazhenskii, M. A. Putyato, and T. A. Gavrilova, Physica E 6, 828 (2000).
4. G. Sáfrán, S. Watanabe, T. Suzuki, J. Ariake, N. Honda, K. Ouchi, P. B. Barna, and G. Radnóczi, Trans. Magn. Soc. Jpn. 2, 76 (2002).
5. R. O. Avakian, K. T. Avetyan, K. A. Ispirian, and E. G. Melikian, Nucl. Instrum. Methods A 508, 496 (2003).
6. J. Birch, S. Tungasmita, and V. Darakchieva, Vacuum Science and Technology: Nitrides as Seen by the Technology (Research Signpost, Trivandrum, 2002), p. 421.
7. S. Tungasmita, J. Birch, P. O. Å. Persson, K. Järrendahl, and L. Hultman, Appl. Phys. Lett. 76, 170 (2000).
8. L. Vegard, Z. Phys. 5, 17 (1921).
9. K. Robbie and M. J. Brett, J. Vac. Sci. Technol. A 15, 1460 (1997).
10. G. Radnóczi, M.-A. Hasan, and J.-E. Sundgren, Thin Solid Films 240, 39 (1994).