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Volumn 584, Issue 1, 2005, Pages 34-37

Optimized sub-40 nm planar patterning process for a La0.7Sr 0.3MnO3 magnetic memory

Author keywords

Manganite; MRAM; Nanolithography; Spintronics

Indexed keywords

ETCHING; LANTHANUM COMPOUNDS; LITHOGRAPHY; OPTIMIZATION;

EID: 25444478097     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2004.02.021     Document Type: Conference Paper
Times cited : (2)

References (9)
  • 7
    • 85009410915 scopus 로고    scopus 로고
    • Ph. Lecoeur, B. Mercey, to be published
    • Ph. Lecoeur, B. Mercey, to be published.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.