Extension of Hodgkinson's model for optical characterization of columnar thin films

Microwave and Optical Technology Letters

Volumn 42, Issue 1, 2004, Pages 72-73

  Chiadini, Francesco ^a   Lakhtakia, Akhlesh ^b  

^a UNIVERSITY OF SALERNO   (Italy)

^b The Pennsylvania State University   (United States)

Author keywords

Columnar thin films; Refractive indexes; Sculptured thin films

Indexed keywords

COLUMNAR THIN FILMS; EXTENSION; HODGKINSON'S MODEL; VAPOR INCIDENCE;

EVAPORATION; OPTICAL CHARACTER RECOGNITION; PHYSICAL VAPOR DEPOSITION; PRESSURE CONTROL; REFRACTIVE INDEX; TEMPERATURE CONTROL;

THIN FILMS;

EID: 2542618436     PISSN: 08952477     EISSN: None     Source Type: Journal    
DOI: 10.1002/mop.20212     Document Type: Article

References (4)

1. D.M. Mattox, The Foundations of Vacuum Coating Technology, Noyes Publications, Park Ridge, NJ, 2003.
2. I. Hodgkinson, Q. Wu, and J. Hazel, Empirical equations for the principal refractive indices and column angle of obliquely deposited films of tantalum oxide, titanium oxide, and zirconium oxide, Appl Opt 37 (1998), 2653-2659.
3. I.J. Hodgkinson and Q. Wu, Birefringent thin films and polarizing elements, World Scientific, Singapore, 1997.
4. A. Lakhtakia, Pseudo-isotropic and maximum-bandwidth points for axially excited chiral sculptured thin films, Microwave Opt Technol Lett 34 (2002), 367-371.