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Microsystem Technologies
Volumn 4, Issue 1, 1997, Pages 46-50
Tensile testing device for microstructured specimens
Author keywords

[No Author keywords available]
Indexed keywords

EID: 2542599232     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420050091     Document Type: Article
Times cited : (17)
References (4)
  • 1
    • 2542532964 scopus 로고    scopus 로고
    • Light optical deformation measurements in microbars with nanometer resolution
    • Springer-Verlag
    • Mazza E; Danuser G; Dual J: (1996) Light optical deformation measurements in microbars with nanometer resolution, Micro System Technologies 2, Springer-Verlag, pp. 226-230
    • (1996) Micro System Technologies , vol.2 , pp. 226-230
    • Mazza, E.1    Danuser, G.2    Dual, J.3
  • 2
    • 85013897362 scopus 로고
    • Ein neues Prinzip der Werkstoffprüfmaschine
    • 1990
    • Markowski W: (1990) Ein neues Prinzip der Werkstoffprüfmaschine, Materialprüfung 32, 1990, S. 144-148
    • (1990) Materialprüfung , vol.32 , pp. 144-148
    • Markowski, W.1
  • 3
    • 0022717983 scopus 로고
    • Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moduling (LIGA process)
    • Elsevier Science Publisher B.V. (North-Holland)
    • Becker EW; Ehrfeld W; Hagmann P; Maner A; Münchmeyer D: (1986) Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moduling (LIGA process), Microelectronic Engineering 4, Elsevier Science Publisher B.V. (North-Holland), pp. 35-56
    • (1986) Microelectronic Engineering , vol.4 , pp. 35-56
    • Becker, E.W.1    Ehrfeld, W.2    Hagmann, P.3    Maner, A.4    Münchmeyer, D.5
  • 4
    • 0001725327 scopus 로고
    • Progress in Deep-Etch Synchrotron Radiation Lithography
    • Proc. 31st. Int. Symp. on Electron, Ion and Photon Beams, Woodland Hills, USA, 1987 Jan/Feb.
    • Ehrfeld W; Baving HJ; Beets D; Bley P; Götz F; Mohr J; Münchmeyer D; Scheib W: (1988) Progress in Deep-Etch Synchrotron Radiation Lithography, Proc. 31st. Int. Symp. on Electron, Ion and Photon Beams, Woodland Hills, USA, 1987. J. Vac. Sci. Technol. B6 (1), Jan/Feb. pp. 178-182
    • (1988) J. Vac. Sci. Technol. , vol.B6 , Issue.1 , pp. 178-182
    • Ehrfeld, W.1    Baving, H.J.2    Beets, D.3    Bley, P.4    Götz, F.5    Mohr, J.6    Münchmeyer, D.7    Scheib, W.8

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.