New LIGA exposure source in China

Microsystem Technologies

Volumn 4, Issue 2, 1998, Pages 58-60

  Tang, E ^a   Yi, F ^a   Zhang, S B ^b   Chen, D ^b  

^a INSTITUTE OF HIGH ENERGY PHYSICS   (China)

^b SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 2542527860     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420050094     Document Type: Article

References (3)

1. Shanghai: Synchrotron Radiation Facility, Conceptual Design Report (Drift) p5_42.5_49, Shanghai, September 1996
2. Gerner M; et al.: (1996) Microlithography Facilities at BESSY, SRN, Vol. 9, No. 3, p. 17-23
3. Tang E; et al.: LIGA technology in BSRF, p. 126-129, Vol. 2, No. 3, Aug. 1996