Microlithography facilities at BESSY

Synchrotron Radiation News

Volumn 9, Issue 3, 1996, Pages 17-23

  Gerner, M ^a   Kuhrich H ^a   Martin, M ^a   Petersen, H ^a   Scheer, M ^a   Wustefeld G ^a   Huber, H L ^b   Oertel, H K ^b   Scheunemann, H U ^b  

^a Berliner Elektronenspeicherringgesellschaft für Synchrotronstrahlung mbH   (Germany)

^b FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041012235     PISSN: 08940886     EISSN: 19317344     Source Type: Journal    
DOI: 10.1080/08940889608602876     Document Type: Article

References (8)

1. Heuberger, A., 1986. Microelectronic Engineering, 5: 3
2. Becker, E.W., 1986. Microelectronic Engineering, 4: 35
3. Rogner, A., 1992. J. Micromech. Microeng., 2: 133
4. Ehrfeld, W., and Lehr, H., 1995. Radial Phys. Chem., 45(3): 349
5. Jung, Ch., ed. 1995. Research at BESSY, A User's Handbook, 2nd edition, BESSY.
6. Bürkmann, K., 1992. Proc. of the 3rd European Particle Accelerator Conference (EPAC 92). 1992, Berlin, Germany. pp. 1699–1702.
7. Thomagel, R., 1996. Rev. Sci. Instrum., 67(2)
8. Krämer, D., 1994. Proc. of the 4th European Particle Accelerator Conference (EPAC 94). 1994, London, England. pp. 585–587.