In situ atomic force microscopic observation of growth of islands of organic contaminants on an H-Si(1 1 1) surface

Applied Surface Science

Volumn 230, Issue 1-4, 2004, Pages 345-349

  Fukuda, Atsushi ^a   Matsumura, Michio ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

AFM; Contaminant; Organic; Silicon; Surface

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS CHROMATOGRAPHY; HYDROGEN INORGANIC COMPOUNDS; IMPURITIES; OXIDATION; SILICON WAFERS;

DEOXYGENATORS; NANOSENSORS; ORGANICS; SURFACE;

SEMICONDUCTOR GROWTH;

EID: 2542486766     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.02.050     Document Type: Article

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